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IVS 135
Description:
The IVS-120/135 is a good choice for measuring processes with
1um lines. It also performs registration overlay measurements
(RG) between two different process steps to ensure
accurate alignment between layers.
Pattern recognition is used to enable automatic CD
measurement on similar targets across a 150mm wafer.
It is a "recipe-based" machine, so process engineer sets up
a CD recipe on one stepper field (die), simply programs a list
of fields to visit, and then it runs the recipe on multiple locations
on the wafer.
Precision of measurement for a 1um CD is specified from the
factory at 12nm 3-sigma. Precision for overlay registration (RG)
is 3nm 3-sigma when the machine was shipped from the
factory.
It handles wafer sizes of 100mm, 125mm, 150mm, and 200mm.
It has 3 cassette platforms, and can handle different sized cassettes.
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